• Well-ordered 3-D nanostructures in a large area with high  throughput can be achieved using a variety of materials.

2) Creep assisted sequential Imprinting Technique

• Simple sequential imprinting method using mechanical creep-behavior of polymer
• The degree of freedom of structural shape is very high.
• Introducing the nano-patterns on the whole surface is possible.Well-ordered 3-D nanostructures in a large area with high  throughput can be achieved using a variety of materials.

3) Multiplex lithography

• Multiscale Multilevel structures are can be easily fabricated via oxygen inhibition effect during photo-polymerization  of PUA and the different curing degree of PUA membrane between bottom and top surface.